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Technology

Technical Papers and Presentations - 2009

IPFA 2009 (Suzhou, China)

EFUG 2009

  • "Design for Edit," T. Lundquist (Poster)

ESREF 2009

DCG/Spirox Technical Seminar - Taiwan

  • "The Role of Spirox in FA Challenges & Solutions," CJ Hsieh (Spirox EVSD)
  • "DFP: The Future of FA," Colin Bolger (Spirox EVSD)
  • "Design-for-Test Enabled Dynamic Emission for Failure Analysis and Yield Enhancement," Steven Kasapi, (NVIDIA)
  • Smart Alternative Solution for IC and System Level ESD Issues, " Yoon-Jong Huh, API/GTL
  • "FIB Modification of Advanced Si Devices for 45nm and Beyond," Dane Scott (Intel)
  • "FA Solutions for Advanced Process Technologies," Israel Niv (DCG)

DCG Technical Seminar 2009 - Japan

  • "FIB Modification of Advanced Si Devices for 45nm and Beyond," Dane Scott (Intel)
  • "Design-for-Test Enabled Dynamic Emission for Yield Enhancement," Steven Kasapi (NVIDIA)
  • "Current Yield Analysis Processes and Challenges," Takashi Setoya (Toshiba)
  • "FA Workflow at Toshiba, Ohita Fab," Takashi Setoya (Toshiba)
  • "Failure Analysis Workflow using DCG Tools," Akira Shimase (Renesas)
  • "Reverse Engineering Techniques," Shigeru Nakajima (VAN Partners Corporation)

LSI Test Symposium (LSIT) 2009 - Japan

  • "Meridian-IV laser voltage imaging and probing options," S. Motegi, et al.
  • "A Next generation circuit edit system," S. Motegi, et al.
  • "Contact to diffusions for advanced backside circuit edit," H. Tanaka, et al.
  • "Characterization of transistor by use of backside FIB circuit edit, K. Goshima, et al. (with Sanyo)

DCG Technical Seminar 2009 - North America

ISTFA 2009

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